[PS-1-6] Mechanism of Low-Temperature Activation of B in Si by Soft X-ray Irradiation

A. Heya¹、T. Fukuoka¹、N. Matsuo¹、K. Kanda²、T. Noguchi³ (1.Univ.of Hyogo、2.LASTI, Univ.of Hyogo、3.Univ.of the Ryukyus (Japan))

https://doi.org/10.7567/SSDM.2013.PS-1-6