10:45 〜 11:00

[C-7-1] Formation of Thermally Stable a-Si Passivation Films using Liquid Si

^○C. Guo¹, K. Ohdaira¹, H. Takagishi², T. Shimoda¹ (1.JAIST, 2.Fukushima Univ(Japan))

https://doi.org/10.7567/SSDM.2015.C-7-1