Fabrication of GaN high-aspect fine nano-hole array structures by hydrogen atmosphere anisotropic thermal etching with ammonia gas

16:45 〜 17:00

[F-2-03] Fabrication of GaN high-aspect fine nano-hole array structures by hydrogen atmosphere anisotropic thermal etching with ammonia gas

^○Y. Moriya¹, Y. Ooe¹, Y. Kawasaki¹, D. Ito¹, A. Kikuchi^1,2 (1.Sophia Univ. (Japan), 2.Sophia Photonics Res. Center (Japan))