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[PS-10-08] Characterization of Al_1-xTi_xO_y thin films deposited by mist-CVD

^○Z. Yatabe¹, K. Nishiyama¹, K. Nishimura¹, Y. Nakamura^1,2 (1.Kumamoto Univ. (Japan), 2.Kumamoto Phoenics (Japan))

https://doi.org/10.7567/SSDM.2019.PS-10-08