Low-temperature Ge/Si interstitials-mediated local densification and nanocrystalli- zation of CVD Si3N4 for advanced Si photonics and electronics

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[PS-9-03] Low-temperature Ge/Si interstitials-mediated local densification and nanocrystalli- zation of CVD Si3N4 for advanced Si photonics and electronics

^○K.P. Peng¹, T.L. Huang¹, T. George¹, H.C. Lin¹, P.W. Li¹ (1.National Chiao Tung Univ. (Taiwan))