15:45 〜 16:15
[K-6-01 (Invited)] Si and SiGe Epitaxial Growth in view of Nanosheet CMOS Devices and 3D Sequential Integration
〇Roger Loo1、Andriy Hikavyy1、Clement Porret1、Erik Rosseel1、Gianluca Rengo1,2,3、Rami Khazaka4、Qi Xie4、André Vantomme2、Robert Langer1
(1.imec、2.Quantum Solid State Physics, KU Leuven、3.Fonds Wetenschappelijk Onderzoek (FWO) - Vlaanderen、4.ASM Belgium NV)
https://doi.org/10.7567/SSDM.2021.K-6-01