2020年第81回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

17 ナノカーボン » 17.2 グラフェン

[9a-Z29-1~14] 17.2 グラフェン

2020年9月9日(水) 08:30 〜 12:30 Z29

前田 文彦(福岡工大)

10:15 〜 10:30

[9a-Z29-8] Temperature dependence of twisted graphene formation on graphene/silicon carbide template

姚 瑶1、根岸 良太1、高村 真琴2、谷保 芳孝2、小林 慶裕1 (1.阪大、2.NTT物研)

キーワード:グラフェン形成

Twisted few layer graphene (FLG) has recently attracted great attention due to the appearance of the exotic electrical properties, such as superconductivity and Mott-like insulator [1]. In previous study [2], we reported that the FLG was synthesized by overlayer growth of graphene on a monolayer graphene template using a chemical vapor deposition (CVD) method [3]. We found that the grown 2D graphene islands have the random twisted angles due to the coalescence of islands, leading the formation of the weak interlayer coupling like a turbostratic stacking. In this study, to understand the growth mechanism of twisted FLG, we examined the temperature dependence systematically and proposed the vertical and lateral morphology model in graphene islands grown on graphene template.