The Japan Society of Applied Physics

[P1-22] Ultra-Shallow p+/n Junction Prepared by Low Energy BF3 Plasma Doping(PLAD) and KrF Excimer Laser Annealing

Dongkyu Lee、Sungkweon Baek、Changhee Cho、Sungho Heo、Hyunsang Hwang (1.Gwangju Institute of Science & Technology (GIST), Dept. of Materials Sci. & Eng.)

https://doi.org/10.7567/SSDM.2005.P1-22