Patterning of Polystyrene Thin Films by Colloidal Lithography: Influences of Quantity of UV Light and Solvent

Presentation information

Academic Program (AP)

Colloid and Interface Chemistry

Sat. Mar 16, 2019 1:30 PM - 5:40 PM I2 (1012, Bldg. 10 [1F])

1I2-28～1I2-33　NISHI, Hiroyasu
1I2-35～1I2-40　TASHIRO, Shouhei
1I2-42～1I2-47　YAMAUCHI, Miho
1I2-49～1I2-52　KAMEYAMA, Tatsuya

3:50 PM - 4:00 PM

○KANEKO, Rino; IMURA, Yoshiro; WANG, Ke-hsuan; KAWAI, Takeshi (Fac. Eng., TUS)

PC Setting Time : 15:40 - 15:50

Keywords:Patterning of thin films、Colloidal lithography、Polystyrene、UV irradiation

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