Formation of fine pattern of novel alicyclic polyimides based on reaction development patterning using aqueous alkaline developers

Presentation information

Academic Program (AP) [Poster]

Polymer

Sat. Mar 16, 2019 12:30 PM - 2:00 PM P (Arena, Gymnasium and Auditorium [1F])

Presentation time：Odd Poster Number 12:30-13:15 / Even Poster Number 13:15-14:00

○MOTOMURA, Momoe; TOKORO, Yuichiro; OYAMA, Toshiyuki; WATANABE, Daisuke (Grad. Sch. Eng., Yokohama Natl. Univ.; JXTG Nippon Oil & Energy Corp.)

Keywords:alicyclic polyimides、reaction development patterning、photolithography、high solubility、colorless

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