Development of high gas barrier thin film forming method with coating polysilazane and using photo irradiation and development to heat resistant organic film

Presentation information

Academic Program (AP) [Poster]

Materials Chemistry

Sat. Mar 16, 2019 12:30 PM - 2:00 PM P (Arena, Gymnasium and Auditorium [1F])

Presentation time：Odd Poster Number 12:30-13:15 / Even Poster Number 13:15-14:00

○KOSEI, Ichikawa; TOMOJI, Ohishi (Grad. Sch. Eng. Sci., Shibaura Inst. of Tech.)

Keywords:high gas barrier characteristics、organic film、polysilazane、photo irradiation、coating method

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