The 99th CSJ Annual Meeting

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Academic Program (AP)

Materials Chemistry

Materials Chemistry

Mon. Mar 18, 2019 1:10 PM - 3:20 PM G1 (361, Bldg. 3 [6F])

3G1-26　SHINOKUBO, Hiroshi
3G1-33～3G1-38　YAMADA, Hiroko

PM

2:30 PM - 2:40 PM

[3G1-34] Analysis of Surface Relief Structure Formed by Photopolymerization with a Grating Mask

Oral A

○HASHIMOTO, Sayuri; AIZAWA, Miho; AKAMATSU, Norihisa; SASAKI, Takeo; SHISHIDO, Atsushi (Lab. Chem. Life Sci., Tokyo Tech.; Fac. Sci., TUS)

PC Setting Time : 14:10 - 14:20

Keywords:Liquid Crystal、Photopolymerization、Molecular Alignment、Surface Profile

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