Electrical property investigation of the SiO<sub>2</sub>/ Si interface processed by reactive plasma deposition

Tomohiko Hara

講演情報

We-P: Poster-2

General

We-P: Poster-2

✳︎Participants can view e-posters and short presentation videos anytime during Aug. 29 - Sep. 8 on the DRIP XIX website.

2022年8月31日(水) 18:45 〜 20:00 DRIP-Poster-ZOOM

△ [WeP-03] Electrical property investigation of the SiO₂/ Si interface processed by reactive plasma deposition

*Tomohiko Hara¹, Tappei Nishihara^2,4, Tomoya Yamada¹, Yuto Ifuji¹, Yuito Yasukouchi¹, Hirotaka Tamashiro¹, Daiki Nakanishi², Satoshi Yasuno³, Hyunju Lee^2,1, Yoshio Ohshita^1,5, Atsushi Ogura^2,5 (1. Toyota Technol. Inst., 2. Meiji Univ, 3. JASRI, 4. JSPS Research Fellow, 5. Meiji Renewable Energy Laboratory Institute)

講演情報

We-P: Poster-2

✳︎Participants can view e-posters and short presentation videos anytime during Aug. 29 - Sep. 8 on the DRIP XIX website.

△ [WeP-03] Electrical property investigation of the SiO2/ Si interface processed by reactive plasma deposition

△ [WeP-03] Electrical property investigation of the SiO₂/ Si interface processed by reactive plasma deposition