InAs Surface Quantum Dot Passivation with Self-Clean-Up: Diethylzinc vs. Trimethylaluminum for Atomic Layer Deposition

Hanif Mohammadi

Presentation information

Oral presentation

Heterostructures and Nanostructures

Heterostructures and Nanostructures 2

Mon. Sep 9, 2024 5:00 PM - 6:15 PM International Conference Hall (Hall A) (3F)

Chair:Kouichi Akahane(National Institute of Information and Communications Technology, Japan)

6:00 PM - 6:15 PM

[MO-A4-05] InAs Surface Quantum Dot Passivation with Self-Clean-Up: Diethylzinc vs. Trimethylaluminum for Atomic Layer Deposition

〇Hanif Mohammadi¹, Ronel Christian Roca¹, Hyunju Lee², Yoshio Ohshita¹, Naotaka Iwata¹, Itaru Kamiya¹ (1. TOYOTA TECHNOLOGICAL INSTITUTE (Japan), 2. Meiji Univ. (Japan))

Abstract password authentication.
Password is required to view the abstract. A password to download the abstracts will be provided in the Program Booklet distributed at the conference venue.