Oxides

[TU-A2-04] Effects of Nitrogen Radical Irradiation to Ga₂O₃ (100) Surface and Its Application to Vertical Ga₂O₃ FinFETs

〇Zhenwei Wang¹, Sandeep Kumar¹, Takafumi Kamimura¹, Shota Sato², Kohki Eguchi², Kura Nakaoka², Syoki Taniguchi², Hisashi Murakami³, Yoshinao Kumagai³, Masataka Higashiwaki^1,2 (1. National Inst. of Info. and Communications Tech. (Japan), 2. Department of Physics and Electronics, Osaka Metropolitan Univ. (Japan), 3. Department of Applied Chemistry, Tokyo Univ. of Agriculture and Tech. (Japan))