Oral Presentation
01: Optical Design, Optical Materials, and Photo Lithography
Tue. Aug 22, 2017 1:00 PM - 3:00 PM Room B (MITAKE) (42F)
Session Chair:M. Shibuya(Tokyo Polytechnic Univ.), C.W. Liang(National Central Univ.)
1:00 PM - 1:30 PM
○Y. Suzuki 1 (1.Olympus Corp. (Japan))
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1:30 PM - 2:00 PM
○L. Tian 1 (1.Boston Univ. (USA))
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2:00 PM - 2:15 PM
○K. Mori 1, K.J. Lee 2, Y.H. Ko 2, D. Carney 2, R. Magnusson 2, K. Kintaka 3, J. Inoue 1, S. Ura 1 (1.Kyoto Inst. Tech. (Japan), 2.Univ. Texas Arlington (USA), 3.AIST (Japan))
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2:15 PM - 2:30 PM
○T. Kobayashi 1, J. Du 2, Z. Liu 2, Y. Leng 2, Z. Hu 3, X. Tang 3, M. Zhou 3 (1.The Univ. of Electro-Communications (Japan), 2.Shanghai Inst. of Optics and Fine Mechanics (China), 3.Chongqing Univ. (China))
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2:30 PM - 2:45 PM
○S.S. Tan 1,2, K. Inagaki 1, S. Yanagisawa 4, M.B. Kassim 2,3, Y. Morikawa 1 (1.Osaka Univ. (Japan), 2.Univ. Kebangsaan Malaysia (Malaysia), 3.Fuel Cell Inst., Univ. Kebangsaan Malaysia (Malaysia), 4.Univ. of the Ryukyus (Japan))
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2:45 PM - 3:00 PM
○C. Pang 1, X.W. Liu 1, M.H. Zhuge 1, C.F. Kuang 1, M.G. Somekh 2, Q. Yang 1,3 (1.Univ. of Zhejiang (China), 2.Hong Kong Polytechnic Univ. (China), 3.Univ. of Shanxi (China))
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