ICOM2023

講演情報

Gas Separation

Processes and Fundamentals

Gas separation 5

2023年7月11日(火) 11:10 〜 12:50 Room 3 (104)

Chair:Jerry Y.S. Lin, Hiroki Nagasawa

11:35 〜 12:00

[O2.GS-06] Highly selective size-sieving gas separation membranes by plasma-enhanced chemical vapor deposition

*Jens Rubner1, Felix Schott1, Hannah Roth1,3, Lara Kleines2, Rainer Dahlmann2, Matthias Wessling1,3 (1. Chemical Process Engineering AVT.CVT, RWTH Aachen University, Forckenbeckstraße 51, 52074 Aachen, Germany, 2. Institute for Plastics Processing (IKV), RWTH Aachen University, Seffenter Weg 201, 52074 Aachen, Germany, 3. DWI—Leibniz-Institute for Interactive Materials, Forckenbeckstraße 50, 52074 Aachen, Germany)

キーワード:organosilica membranes, plasma-enhanced chemical vapor deposition, mixed gas permeation