*Madeline Rodenberg1, Lukas Jonathan Münker2, Rainer Tutsch3, Peter Jomo Walla4, Thomas Weimann5
(1. TU Braunschweig, Institute of Production Metrology (Germany), 2. TU Braunschweig, Institute of Physical and Theoretical Chemistry (Germany), 3. TU Braunschweig, Institute of Production Metrology (Germany), 4. TU Braunschweig, Institute of Physical and Theoretical Chemistry (Germany), 5. Physikalisch-Technische Bundesanstalt Braunschweig, Department Quantum Electronics (Germany))
Keywords:PALM, Superresolution Microscopy, Photoresist
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