ICP2023

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Poster

Joint-1

P26

Wed. Jul 26, 2023 5:10 PM - 7:40 PM Poster (Poster)

17:10-18:25 Odd-Numbered Presentation Time
18:25-19:40 Even-Numbered Presentation Time

5:10 PM - 7:40 PM

[P26-039] Sulfonium-Functionalized Polystyrene Based Non-chemically Amplified Resists Enabling sub-13 nm Nanolithography

*Jinping Chen1, Zhihao Wang1, Yi Li1 (1. Technical Institute of Physics and Chemistry, Chinese Academy of Sciences (China))

Keywords:non-chemically amplified resists, sulfonium functionalized polystyrene, electron beam lithography, extreme ultraviolet lithography

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