Session information

Oral Sessions

B-3 Micro/Nano machining and figurings

[B-3-1] Surface processing of a μ-channel-cut crystal monochromator for reflection self-seeding of hard X-ray free-electron laser

〇Shotaro Matsumura¹, Shota Nakano¹, Yasuhisa Sano¹, Taito Osaka², Ichiro Inoue², Satoshi Matsuyama¹, Makina Yabashi², Kazuto Yamauchi¹ (1.Osaka University, 2.RIKEN SPring-8 Center)

[B-3-2] Numerically Controlled Plasma Chemical Vaporization Machining Using an Array-Type Electrode with an Intermittent Gas Flow System

〇Ryohei Asada¹, Ken Nishida¹, Shinya Okayama¹, Satoshi Matsuyama¹, Kazuto Yamauchi¹, Yasuhisa Sano¹ (1.Osaka University, 2.Osaka University)

[B-3-3] An attempt of micro/nanofabrication of SiC single crystal with plasma electrolysis

〇Shunda Zhan^1,2, Jiajun Lu¹, Yonghua Zhao¹ (1.Southern University of Science and Technology, 2.Harbin Institute of Technology)

[B-3-4] Performance Improvement in Dieless Punching of Ultrasmall-Diameter Holes

〇Shinya Araki¹, Hayata Hamafuji¹, Kai Egashira¹, Keishi Yamaguchi¹ (1.Kyoto Institute of Technology)

[B-3-5] Precise Simulation of Femtosecond Laser Processing Based on Identification of Ablation Parameters by On-Machine Measurement

〇Hiroyuki Kawakami¹, Shunsuke Nabetani¹, Masahiro Ueda^1,2, Hideki Aoyama ¹, Kazuo Yamazaki² (1.Keio University, 2.University of California)

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