Session information

Oral Sessions

B-4 Nano-scale surface finishings

[B-4-1] Basic Study on Polishing Process of Nonwoven Nanofiber Pad with a Ball-Nose Tool

〇Ning Yu¹, Wei Wu², Toshiki Hirogaki¹, Eiichi Aoyama¹, Hiroyoshi Sota² (1.Doshisha University, 2.M-TechX Inc.)

[B-4-2] Improvement of Edge Surface Flatness in Polishing of Silicon Wafers

〇Senju Matsui¹, Urara Satake¹, Toshiyuki Enomoto¹ (1.Osaka University)

[B-4-3] Experimental Investigation of Torques Acting on Upper and Lower Platens in Double-sided Lapping

〇Ryo Ozaki¹, Yohei Hashimoto¹, Hinako Hashimoto¹, Tatsuaki Furumoto¹, Tomohiro Koyano¹, Akira Hosokawa¹ (1.Kanazawa University)

[B-4-4] Liquid-electrolyte-free electrochemical surface finishing of GaN surface using a solid polymer electrolyte

〇Junji Murata¹, Yoshito Nishiguchi² (1.Ritsumeikan University, 2.Kindai University)

[B-4-5] Obtaining of atomically smooth 4H-SiC (0001) surface by optimizing anodic oxidation parameters in slurryless electrochemical mechanical polishing

〇Xu Yang¹, Xiaozhe Yang¹, Kentaro Kawai¹, Kenta Arima¹, Kazuya Yamamura¹ (1.Osaka University)

[B-4-6] Effects of ultrasonic vibration on slurryless electrochemical mechanical polishing of 4H-SiC (0001) surface

〇Xiaozhe Yang¹, Xu Yang¹, Kentaro Kawai¹, Kenta Arima¹, Kazuya Yamamura¹ (1.Osaka University)

[B-4-7] Improvement of Processing Time by Utilizing Cover Plate in Gyro Barrel Finishing

〇Yugo Nakayama¹, Yohei Hashimoto¹, Takuma Ito¹, Tatsuaki Furumoto¹, Tomohiro Koyano¹, Akira Hosokawa¹ (1.Kanazawa University)

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