Session information

Poster Sessions

F-1 Advanced surface processings

[P-28] High-rate Preparation of Hydrophobic Fluorocarbon Film from CF₄ Feedstock Gas by Solid Source Aided Plasma Chemical Vapor Deposition Technique

〇Hiromichi Nakatsuka¹, Rei Tanaka¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka University)

[P-29] Realization of high quality Fe₃O₄ thin film on atomically flat and high crystallinity MgO substrate surface

〇Ai　Isohashi Osaka¹, Daisetsu Toh¹, Kazuto Yamauchi¹, Yasuhisa Sano¹, Hidekazu Tanaka¹, Azusa Nakamoto Hattori¹ (1.Osaka University)

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