B-3 Micro/Nano machining and figurings

[B-3-1] Surface processing of a μ-channel-cut crystal monochromator for reflection self-seeding of hard X-ray free-electron laser

〇Shotaro Matsumura¹、Shota Nakano¹、Yasuhisa Sano¹、Taito Osaka²、Ichiro Inoue²、Satoshi Matsuyama¹、Makina Yabashi²、Kazuto Yamauchi¹ (1.Osaka University、2.RIKEN SPring-8 Center)

キーワード：Processing、X-ray crystal monochromator、Atmospheric-pressure plasma、Damage-free etching、