ICPE2020

講演情報

Oral Sessions

B-4 Nano-scale surface finishings

[B-4-5] Obtaining of atomically smooth 4H-SiC (0001) surface by optimizing anodic oxidation parameters in slurryless electrochemical mechanical polishing

〇Xu Yang1、Xiaozhe Yang1、Kentaro Kawai1、Kenta Arima1、Kazuya Yamamura1 (1.Osaka University)

キーワード:Polishing、slurryless、electrochemical mechanical polishing