[B-5-9] Development of a dicing process for 4H-SiC wafers by Plasma Chemical Vaporization Machining (PCVM) using a metal slit mask 〇Yuma Nakanishi1, Risa Mukai1, Satoshi Matsuyama1, Kazuto Yamauchi1, Yasuhisa Sano1 (1.Osaka University) Keywords:Processing、dicing、plasma etching