F-1 Advanced surface processings

[F-1-8] Gas composition dependence of material removal rate in plasma assisted polishing of single crystal diamond

〇Nian Liu¹, Naoya Yoshitaka¹, Kohki Sugawara², Hideaki Yamada³, Daisuke Takeuchi³, Yuko Akabane², Kenichi Fujino², Kentaro Kawai¹, Kenta Arima¹, Kazuya Yamamura¹ (1.Osaka University, 2.TDC Corporation, 3.National Institute of Advanced Industrial Science and Technology (AIST))

Keywords:Machining、Plasma assisted polishing、High material removal rate、Damage-free、