ICPE2020

Presentation information

Oral Sessions

F-1 Advanced surface processings

[F-1-8] Gas composition dependence of material removal rate in plasma assisted polishing of single crystal diamond

〇Nian Liu1, Naoya Yoshitaka1, Kohki Sugawara2, Hideaki Yamada3, Daisuke Takeuchi3, Yuko Akabane2, Kenichi Fujino2, Kentaro Kawai1, Kenta Arima1, Kazuya Yamamura1 (1.Osaka University, 2.TDC Corporation, 3.National Institute of Advanced Industrial Science and Technology (AIST))

Keywords:Machining、Plasma assisted polishing、High material removal rate、Damage-free、