F-1 Advanced surface processings

[F-1-8] Gas composition dependence of material removal rate in plasma assisted polishing of single crystal diamond

〇Nian Liu¹、Naoya Yoshitaka¹、Kohki Sugawara²、Hideaki Yamada³、Daisuke Takeuchi³、Yuko Akabane²、Kenichi Fujino²、Kentaro Kawai¹、Kenta Arima¹、Kazuya Yamamura¹ (1.Osaka University、2.TDC Corporation、3.National Institute of Advanced Industrial Science and Technology (AIST))

キーワード：Machining、Plasma assisted polishing、High material removal rate、Damage-free、