B-4 Nano-scale surface finishings

[P-11] High-Resolution X-Ray Diffraction Measurement of Sapphire Substrate for Detection of Subsurface Damages

〇Hideo Aida¹, Ryo Yoshihara¹, Hidetoshi Takeda¹, Yutaka Kimura², Toshiro Doi³ (1.Nagaoka University of Technology, 2.Aoyama Gakuin University, 3.Kyushu University/Doi Laboratory Inc.)

Keywords:Polishing、Sapphire substrate、Subsurface damage、Chemical mechanical polishing (CMP)、X-ray diffraction (XRD)