B-4 Nano-scale surface finishings

[P-11] High-Resolution X-Ray Diffraction Measurement of Sapphire Substrate for Detection of Subsurface Damages

〇Hideo Aida¹、 Ryo Yoshihara¹、Hidetoshi Takeda¹、Yutaka Kimura²、Toshiro Doi³ (1.Nagaoka University of Technology、2.Aoyama Gakuin University、3.Kyushu University/Doi Laboratory Inc.)

キーワード：Polishing、Sapphire substrate、Subsurface damage、Chemical mechanical polishing (CMP)、X-ray diffraction (XRD)