High-rate Preparation of Hydrophobic Fluorocarbon Film from CF<sub>4</sub> Feedstock Gas by Solid Source Aided Plasma Chemical Vapor Deposition Technique

[P-28] High-rate Preparation of Hydrophobic Fluorocarbon Film from CF₄ Feedstock Gas by Solid Source Aided Plasma Chemical Vapor Deposition Technique

〇Hiromichi Nakatsuka¹、Rei Tanaka¹、Hiroaki Kakiuchi¹、Kiyoshi Yasutake¹、Hiromasa Ohmi¹ (1.Osaka University)

キーワード：Functional surface、fluorocarbon、hydrophobic、high-rate、CVD