Computational / Analytical Approach for Lithography Processes

[A4] Computational / Analytical Approach for Lithography processes

2022年6月30日(木) 09:00 〜 11:30 Computational / Analytical Approach for Lithography Processes (A4)

Chairman:Tomoki Nagai(JSR Corporation), Takahiro Kozawa(Osaka University)

09:00 〜 09:30

[3A401] Stochastic Defect Formation Analysis in an EUV Photoresist Using Computational Methods [invited]

*Lawrence S Melvin¹, Yudhishthir Kankel¹, Zachary A Levinson¹, Ulrich Welling¹, Hironobu Taoka¹, Hans-jurgen Stock¹, Wolfgang Demmerle¹ (1. Synopsys)

09:30 〜 10:00

*Takahiro Kozawa¹ (1. Osaka University)

10:00 〜 10:30

*Momoji Kubo¹ (1. Institute for Materials Research, Tohoku University)

10:30 〜 11:00

Kyohei Imai¹, Bunta Inoue¹, Yoshihiko Hirai¹, *Masaaki Yasuda¹ (1. Osaka Metropolitan University)

11:00 〜 11:30

*Kenji Yoshimoto¹ (1. Toray Industries, Inc.)