・Dr. Danilo De Simone (imec): "EUV interference exposure process, worldwide research collaboration on stochastic problems, realistic future EUV dose considering photon shot noise effects"
・Dr. Tomoki Nagai (JSR): "Resolution limit of CAR, current status and development of metal resists, the challenge to high NA, requests from material manufacturers, etc."
・Dr. Seiji Nagahara (TEL): "Challenges and issues for 10 nm patterning from the viewpoint of EUV equipment manufacturer, overcoming stochastic problems in device fabrication, expectations for new materials (non-CAR, etc.)"
・Dr. Chandra Sarma (Intel): "Current status of DSA, material requirements and challenges, current status and challenges for Defect in DSA"
・Prof. Takeo Watanabe (Univ. of Hyogo): "EUV material design / EUV basic research infrastructure (including metrology and analysis requirements)"