ICSCRM2019

Session information

Oral Presentation

MOS Gate Stacks and Device Processing

[We-1A] Interface Defect Structures

Wed. Oct 2, 2019 8:45 AM - 10:15 AM Room A (Kyoto International Conference Center)

9:15 AM - 9:30 AM

*Mark Anders1, Patrick M Lenahan2, Arthur H Edwards3, Peter A Schultz4, Renee M Van Ginhoven3 (1. National Institute of Standards and Technology(United States of America), 2. Pennsylvania State University(United States of America), 3. Air Force Research Laboratory(United States of America), 4. Sandia National Laboratories(United States of America))

9:30 AM - 9:45 AM

*James P. Ashton1, Patrick M. Lenahan1, Daniel J. Lichtenwalner2, Mark A. Anders3, Aivars J. Lelis4 (1. Penn State Univ.(United States of America), 2. Wolfspeed, a Cree Company(United States of America), 3. National Inst. of Standards and Tech.(United States of America), 4. United States Army Res. Labs.(United States of America))

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