8:45 AM - 9:15 AM
*Gregor Pobegen1, T Aichinger2, G Rescher2 (1. KAI Kompetenzzentrum für Automobil- und Industrieelektronik GmbH(Austria), 2. Infineon Technologies AG(Austria))
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Schedule
Session information
Oral Presentation
MOS Gate Stacks and Device Processing
[Fr-1A] Oxide Stability and Reliability
Fri. Oct 4, 2019 8:45 AM - 10:00 AM Room A (Kyoto International Conference Center)
9:15 AM - 9:30 AM
*Dai Okamoto1, Hiroki Nemoto1, Xufang Zhang1, Xingyan Zhou1, Mitsuru Sometani2, Mitsuo Okamoto2, Shinsuke Harada2, Tetsuo Hatakeyama2, Noriyuki Iwamuro1, Hiroshi Yano1 (1. Univ. Tsukuba(Japan), 2. AIST(Japan))
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Schedule
9:30 AM - 9:45 AM
*Judith Berens1,2, Gregor Pobegen1, Tibor Grasser2 (1. KAI GmbH(Austria), 2. Inst. for Microelectronics, TU Wien(Austria))
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Schedule
9:45 AM - 10:00 AM
*Hiroki Nemoto1, Dai Okamoto1, Xufang Zhang1, Mitsuru Sometani2, Mitsuo Okamoto2, Tetsuo Hatakeyama2, Shinsuke Harada2, Noriyuki Iwamuro1, Hiroshi Yano1 (1. Univ. of Tsukuba(Japan), 2. National Inst. of Advanced Indus. Sci. and Tech.(Japan))
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Schedule