ICSCRM2019

Session information

Poster Presentation

Poster Presentation

[Mo-P] Poster Presentation

Mon. Sep 30, 2019 3:45 PM - 5:45 PM Annex Hall 1 (Kyoto International Conference Center)

3:45 PM - 5:45 PM

*Naoya Morioka1, Roland Nagy1, Matthias Niethammer1, Izel Gediz1, Erik Hesselmeier1, Matthias Widmann1, Yu-Chen Chen1, Roman Kolesov1, Péter Udvarhelyi2, Cristian Bonato3, Jawad Ul Hassan4, Robin Karhu4, Ivan Gueorguiev Ivanov4, Nguyen Tien Son4, Jeronimo R. Maze5, Takeshi Ohshima6, Öney O. Soykal7, Ádám Gali2, Sang-Yun Lee8, Florian Kaiser1, Jörg Wrachtrup1 (1. Univ. of Stuttgart(Germany), 2. Hungarian Academy of Sci.(Hungary), 3. Heriot-Watt Univ.(UK), 4. Linköping Univ.(Sweden), 5. Pontifical Catholic University of Chile(Chile), 6. National Inst. for Quantum and Radiological Sci. and Tech.(Japan), 7. Naval Res. Lab.(United States of America), 8. Korea Inst. of Sci. and Tech.(Korea))

3:45 PM - 5:45 PM

*Hannes Kraus1, David J. Spry2, Philip G. Neudeck2, Yuichi Yamazaki3, Shin-Ichiro Sato3, Takeshi Ohshima3, Corey J. Cochrane1 (1. NASA Jet Propulsion Lab. / California Inst. of Tech., Pasadena, CA(United States of America), 2. NASA Glenn Res. Center, Cleveland, OH(United States of America), 3. National Inst. of Quantum and Radiological Sci. and Tech., Takasaki, Gunma(Japan))

3:45 PM - 5:45 PM

*Roland Weingaertner1, Birgit Kallinger1, Thomas Wicht1, Patrick Berwian1, Christian Kranert1, Christian Reimann1, Elke Meissner1, Jürgen Gräßlin2, Uwe Preckwinkel2, Jochen Friedrich1 (1. Fraunhofer Institute for Integrated Systems and Device Technology IISB, Schottkystraße 10, 91058 Erlangen(Germany), 2. Rigaku Europe SE, Hugenottenallee 167, 63263 Neu-Isenburg(Germany))

3:45 PM - 5:45 PM

*Ying Song1, Zong Wei Xu1, Tao Liu1, Mathias Rommel2, Hong Wang3, Feng Zhou Fang1 (1. State Key Lab. of Precision Measuring Tech. & Instruments, Centre of Micro/Nano Manufacturing Tech. Tianjin Univ. (China), 2. Fraunhofer Inst. for Integrated Systems and Device Tech.(Germany), 3. State Key Lab. of Separation Membranes and Membrane Processes, School of Materials Sci. and Engineering, Tianjin Polytechnic Univ.(China))

3:45 PM - 5:45 PM

Nick Gilles Schneider1, *Johanna Mueting1, Roberta Nipoti2, Ute Drechsler3, Ulrike Grossner1 (1. Advanced Power Semiconductor Laboratory, ETH Zurich Univ.(Switzerland), 2. IMM-CNR, unit of Bologna Res.(Italy), 3. IBM Zurich Res.(Switzerland))

3:45 PM - 5:45 PM

*Khaled DRICHE1,3, Aurélien Maréchal2, Hitoshi Umezawa1,4, Nicolas Rouger5, Etienne Gheeraert1,3 (1. Univ. Grenoble Alpes, CNRS, Grenoble INP, Inst. NEEL(France), 2. Univ. Grenoble Alpes, CNRS, Grenoble INP, G2ELab(France), 3. Univ. of Tsukuba(Japan), 4. AIST(Japan), 5. Univ. de Toulouse, CNRS, LAPLACE(France))

3:45 PM - 5:45 PM

*Aleksandr A Lebedev1, Vitalii Kozlovski2, Leonid Fursin3, Anatoly M Strel’chuk1, Pavel A Ivanov1, Mikhail E Levinshtein1, Aleksandr V A. Zubov4 (1. Ioffe Institute,Polytekhnicheskaya 26, St. Petersburg 194021, Russia(Russia), 2. St. Petersburg State Polytechnic University, Polytekhnicheskaya 29, St. Petersburg 195251, Russia(Russia), 3. United Silicon Carbide, Inc., 7 Deer Park Drive, Suite E Monmouth Junction, NJ 08852, USA(United States of America), 4. National Research University of Information Technologies, Mechanics, and Optics, St. Petersburg 197101, Russia(Russia))

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