ICSCRM2019

講演情報

Oral Presentation

MOS Gate Stacks and Device Processing

[Mo-2A] Oxidation and Nitridation

2019年9月30日(月) 14:15 〜 15:30 Room A (Kyoto International Conference Center)

14:30 〜 14:45

[Mo-2A-02] Investigation of SiC Microwave Plasma Oxidation Kinetics via Oxygen Isotope Labelling

*Nannan You1,2, Shengkai Wang1,2, Jilong Hao1,2, Yun Bai1,2, Xinyu Liu1,2 (1. Institute of Microelectronics of the Chinese Academy of Sciences(China), 2. University of Chinese Academy of Sciences(China))