ICSCRM2019

講演情報

Oral Presentation

Growth and Wafer Manufacturing

[Mo-2B] 3C-hetero-epitaxy

2019年9月30日(月) 14:15 〜 15:30 Annex Hall 2 (Kyoto International Conference Center)

14:30 〜 14:45

[Mo-2B-02] 3C-SiC growth on ISP substrates: effects of substrate geometry on void formation and growth rate

*M. Zimbone1, C. Calabretta1, M. Zielinski2, F. Mancarella1, Francesco La Via1 (1. CNR-IMM(Italy), 2. NOVASiC(France))