Schedule 7 3:45 PM - 5:45 PM [Mo-P-06] Achievement of low carrier concentration of high-uniformity SiC films grown by high speed wafer rotation vertical CVD tool *Yoshiaki Daigo1, Akio Ishiguro1, Shigeaki Ishii1, Takehiko Kobayashi1, Yoshikazu Moriyama1 (1. NuFlare Technology, Inc.,(Japan))
