[Mo-P] Poster Presentation

[Mo-P-09] High etching rate photo-electrochemical CARE (catalyst referred etching) of SiC by a potential control of catalyst surface

*Ryosuke Ohnishi¹, Daisetsu Toh¹, Hideka Kida¹, Satoshi Matsuyama¹, Yasuhisa Sano¹, Kazuto Yamauchi^1,2 (1. Department of Precision Sci. and Tech., Graduate School of Eng., Osaka Univ.(Japan), 2. Res. Center of Ultra-Precision Sci. and Tech., Graduate School of Eng., Osaka Univ.(Japan))