Schedule 6 1:45 PM - 3:45 PM [Th-P-06] Improvement of repeatability on N-type 4H-SiC epitaxial growth by high speed wafer rotation vertical CVD tool *Yoshiaki Daigo1, Akio Ishiguro1, Shigeaki Ishii1, Takehiko Kobayashi1, Yoshikazu Moriyama1 (1. NuFlare Technology, Inc.,(Japan))