[Tu-P] Poster Presentation

[Tu-P-08] Cause of etch pits during the high speed plasma etching of silicon carbide and an approach to reduce their size

*Yuma Nakanishi¹, Risa Mukai¹, Satoshi Matsuyama¹, Kazuto Yamauchi^1,2, Yasuhisa Sano¹ (1. Department of Precision Sci. and Tech., Graduate School of Eng., Osaka Univ.(Japan), 2. Res. Center of Ultra-Precision Sci. and Tech., Graduate School of Eng., Osaka Univ.(Japan))