[Tu-P] Poster Presentation

[Tu-P-24] Monitoring on Creation and Annihilation of Interface Trap Levels with NO Oxidation, Re-Oxidation and N₂ Annealing with Conductance Measurements

*Xiang Zhou¹, Collin W. Hitchcock¹, Rajendra P Dahal¹, Gyanesh Pandey¹, Jacob Kupernik¹, Ishwara B. Bhat¹, T. Paul Chow¹ (1. Rensselaer Polytechnic Institute (RPI)(United States of America))