ICSCRM2019

講演情報

Oral Presentation

Growth and Wafer Manufacturing

[We-2B] 4H-homo-epitaxy

2019年10月2日(水) 10:45 〜 12:15 Annex Hall 2 (Kyoto International Conference Center)

11:30 〜 11:45

[We-2B-03] High Reliable 4H-SiC Epitaxial Wafer with BPD Free Recombination-Enhanced Buffer Layer for High Current Applications

*Hironori Itoh1, Taro Enokizono1, Takaya Miyase1, Tsutomu Hori1, Keiji Wada1, Hideyuki Doi1, Masaki Furumai1 (1. Sumitomo Electric Industries, Ltd.(Japan))