[We-P] Poster Presentation

[We-P-07] Non-plasma dry etcher design for 200 mm-diameter silicon carbide wafer

Ryohei Kawasaki¹, Kenta Irikura¹, *Hitoshi Habuka¹, Yoshinao Takahashi², Tomohisa Kato³ (1. Yokohama National University(Japan), 2. KANTO DENKA KOGYO CO., LTD(Japan), 3. AIST(Japan))