スケジュール 3 16:15 〜 18:15 [We-P-26] Manganese Doping for Highly-Resistive SiC: a Deep Level Study *Giovanni Alfieri1, Stephan Wirths1, Dan Mihai Buca2, Enea Bianda1 (1. ABB(Switzerland), 2. Jülich Res.(Germany))