2019年10月2日(水) 16:15 〜 18:15Annex Hall 1 (Kyoto International Conference Center)
スケジュール
3
16:15 〜 18:15
[We-P-29] A Comparison of Active Near-Interface Traps in Nitrided and As-Grown Gate Oxides by the Direct Measurement Technique
*PEYUSH PANDE1, Sima Dimitrijev1, Daniel Haasmann1, Hamid Amini Moghadam1, Philip Tanner1, Jisheng Han1(1. Queensland Micro- and Nanotechnology Center, Griffith University(Australia))