[We-P] Poster Presentation

[We-P-34] Development of SiC etching by chlorine monofluoride gas

*Yoshinao Takahashi^1,2, Korehito Kato², Hitoshi Habuka¹ (1. Yokohama National Univ.(Japan), 2. KANTO DENKA KOGYO CO., LTD.(Japan))