Wed. Oct 2, 2019 4:15 PM - 6:15 PMAnnex Hall 1 (Kyoto International Conference Center)
Schedule
2
4:15 PM - 6:15 PM
[We-P-44] Enhancement of ESD Protection using Wide-trench Structure in 650 V 4H-SiC Junction Barrier Schottky Diode
*Sinsu Kyoung1, Eun-ha Kim1, Joon-hyeok Jeon1,2, Tae Jin Nam1, Young Sung Hong1, Tai Young Kang1(1. Powercubesemi, Inc.(Korea), 2. Hanyang Univ.(Korea))