2019年10月2日(水) 16:15 〜 18:15Annex Hall 1 (Kyoto International Conference Center)
スケジュール
2
16:15 〜 18:15
[We-P-44] Enhancement of ESD Protection using Wide-trench Structure in 650 V 4H-SiC Junction Barrier Schottky Diode
*Sinsu Kyoung1, Eun-ha Kim1, Joon-hyeok Jeon1,2, Tae Jin Nam1, Young Sung Hong1, Tai Young Kang1(1. Powercubesemi, Inc.(Korea), 2. Hanyang Univ.(Korea))